Located in NANO N116, the PVD products PLD/MBE-2500 Pulsed Laser Deposition (PLD) system is one of the facility's thin film deposition systems. This versatile, high-performance system allows for deposition in an ultra-high vacuum, an inert gas environment, or a reactive gas environment, such as oxygen, commonly used when depositing oxides. The system has many features, including:
- Base pressure: ~ 1.5· 10 -8 Torr
- Laser raster
- 6 targets
- Target rotation, raster
- Substrate heating 950° C
- In-situ RHEED thickness monitor
- Load lock - 2 samples
- Substrate rotation
- Combinatorial films