About the Facility
The Central Facility for Nanomaterials & Thin Films provides state-of-the-art instruments for fabricating material samples and devices. The primary focus of the facility is on nanostructuring by using thin film deposition and multi-layering. The facility has 3 thin film deposition systems which can deposit sub nanometer thick films in which 2 or more materials can be layered together in different order to form a multilayer structure. The properties of such samples or devices will depend on the actual intrinsic property of the nanostructuring such as how the materials interact through the interfaces. The facility also provides systems to alloy materials together to study the bulk material properties.
Facility Contacts
Acknowledgement Text
Agencies, including the NSF and the University of Nebraska-Lincoln, providing partial support of our Nebraska Nanoscale Facilities and Nebraska Center for Materials and Nanoscience Facilities require that the following words be included at the end of any Acknowledgement section of a paper in which experimental work was done in NNF-NCMN facilities:
"The research was performed in part in the Nebraska Nanoscale Facility: National Nanotechnology Coordinated Infrastructure and the Nebraska Center for Materials and Nanoscience (and/or NERCF), which are supported by the National Science Foundation under Award ECCS: 2025298, and the Nebraska Research Initiative."